• Mask aligner with UV and DUV (248 nm) light source
• ICP-DRIE
• PVD with e-beam, thermal evaporation, and DC sputtering capability
• Wet etching area: Spinner, hot plates, and other relevant pieces
• Optical microscope with a digital camera and fluorescence detection attachment
• Surface profilometer with 3-D image capture software
• Surface cleaner by plasma chamber
• Oven with vacuum capability
• Cell counting equipment
• Syringe system for microfludics
• SEM with EDX capability
• Macro-Centrifuge
• Vortexer
• Gold and Carbon Sputter
• Optical Microscope with LED light system
• Signal Generators for DEP forces
• UV Light-Curing Flood Lamp System
• Precision Balance
• RTP
• Deep Coater
• Direct Laser Writing Lithography

Note: Some equipment may be out of order. Please contact us first to check whether the instrument you need is avalaible or not.